Standard Code | Standard Title | Standard Class | Order |
---|---|---|---|
GB/T 43313-2023 |
Testing of surface quality and microtube density of Polished silicon carbide wafers by confocal differential interference method {译} 碳化硅抛光片表面质量和微管密度的测试 共焦点微分干涉法 |
China National Standards Polished |
English PDF |
GB/T 30656-2023 |
Silicon carbide single crystal Polished wafer {译} 碳化硅单晶抛光片 |
China National Standards Polished |
English PDF |
GB/T 19921-2018 |
Test method for particles on Polished silicon wafer surfaces 硅抛光片表面颗粒测试方法 |
China National Standards Polished |
English PDF |
GB/T 12964-2018 |
Monocrystalline silicon Polished wafers 硅单晶抛光片 |
China National Standards Polished |
English PDF |
GB/T 34504-2017 |
Measurement method for surface metal contamination on sapphire Polished substrate wafer 蓝宝石抛光衬底片表面残留金属元素测量方法 |
China National Standards Polished |
English PDF |
GB/T 35305-2017 |
Monocrystalline gallium arsenide Polished wafers for solar cell 太阳能电池用砷化镓单晶抛光片 |
China National Standards Polished |
English PDF |
GB/T 31351-2014 |
Nondestructive test method for micropipe density of Polished monocrystalline silicon carbide wafers 碳化硅单晶抛光片微管密度无损检测方法 |
China National Standards Polished |
English PDF |
GB/T 30656-2014 |
Polished monocrystalline silicon carbide wafers 碳化硅单晶抛光片 |
China National Standards Polished |
English PDF |
GB/T 30858-2014 |
Polished mono-crystalline sapphire substrate product 蓝宝石单晶衬底抛光片 |
China National Standards Polished |
English PDF |
GB/T 30712-2014 |
Provision of permissible errors for measurement of Polished diamond mass 抛光钻石质量测量允差的规定 |
China National Standards Polished |
English PDF |
GB/T 29506-2013 |
300mm Polished monocrystalline silicon wafers 300mm 硅单晶抛光片 |
China National Standards Polished |
English PDF |
GB/T 26070-2010 |
Characterization of subsurface damage in Polished compound semiconductor wafers by reflectance difference spectroscopy method 化合物半导体抛光晶片亚表面损伤的反射差分谱测试方法 |
China National Standards Polished |
English PDF |
GB/T 26065-2010 |
Specification for Polished test silicon wafers 硅单晶抛光试验片规范 |
China National Standards Polished |
English PDF |
GB/T 6624-2009 |
Standard method for measuring the surface quality of Polished silicon slices by visual inspection 硅抛光片表面质量目测检验方法 |
China National Standards Polished |
English PDF |
GB/T 4058-2009 |
Test method for detection of oxidation induced defects in Polished silicon wafers 硅抛光片氧化诱生缺陷的检验方法 |
China National Standards Polished |
English PDF |
GB/T 5009.207-2008 |
Determination of 50 organophosphorus pesticides residues in unPolished rice 糙米中50种有机磷农药残留量的测定 |
China National Standards Polished |
English PDF |
GB/T 18303-2008 |
Color grading of Polished diamond by visual matching 钻石色级目视评价方法 |
China National Standards Polished |
English PDF |
GB/T 6060.3-2008 |
Surface roughness comparison specimen - Part 3:Spark-eroded,shot-blasted,grit-blasted,lapped,filed and Polished surface 表面粗糙度比较样块 第3部分:电火花、抛(喷)丸、喷砂、研磨、锉、抛光加工表面 |
China National Standards Polished |
English PDF |
GB/T 18311.16-2007 |
Fibre optic interconnecting devices and passive components - Basic test and measurement procedures - Part 3-16: Examinations and measurements - Endface radius of spherically Polished ferrules 纤维光学互连器件和无源器件 基本试验和测量程序 第3-16部分:检查和测量 球面抛光套管端面半径 |
China National Standards Polished |
English PDF |
GB/T 12964-2003 |
Monocrystalline silicon Polished wafers 硅单晶抛光片 |
China National Standards Polished |
English PDF |
GB/T 13843-1992 |
Polished monocrystalline sapphire substrates 蓝宝石单晶抛光衬底片 |
China National Standards Polished |
English PDF |
Find out:21Items | To Page of: First -Previous-Next -Last | 1 |