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| Standard Code | Standard Title | Standard Class | Order |
|---|---|---|---|
| GB/T 41064-2021 |
Surface chemical analysis—Depth profiling—Method for Sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films 表面化学分析 深度剖析 用单层和多层薄膜测定X射线光电子能谱、俄歇电子能谱和二次离子质谱中深度剖析溅射速率的方法 |
China National Standards Sputter |
 English PDF |
| GB/T 34649-2017 |
Magnetron Sputtering ruthenium target 磁控溅射用钌靶 |
China National Standards Sputter |
English PDF |
| GB/T 32999-2016 |
Surface chemical analysis—Depth profiling—Measurement of Sputtering rate: mesh-replica method using a mechanical stylus profilometer 表面化学分析 深度剖析 用机械轮廓仪栅网复型法测量溅射速率 |
China National Standards Sputter |
English PDF |
| GB/T 31227-2014 |
Test method for the surface roughness by atomic force microscope for Sputtered thin films 原子力显微镜测量溅射薄膜表面粗糙度的方法 |
China National Standards Sputter |
English PDF |
| GB/T 29658-2013 |
High-Purity Sputtering aluminium and aluminium alloy target used in electronic film 电子薄膜用高纯铝及铝合金溅射靶材 |
China National Standards Sputter |
English PDF |
| GB/T 29557-2013 |
Surface chemical analysis - Depth profiling - Measurment of Sputtered depth 表面化学分析 深度剖析 溅射深度测量 |
China National Standards Sputter |
English PDF |
| GB/T 25755-2010 |
Vacuum technology - Sputter-ion pumps - Measurement of performance characteristics 真空技术 溅射离子泵 性能参数的测量 |
China National Standards Sputter |
English PDF |
| GB/T 20175-2006 |
Surface chemical analysis-Sputter depth profiling-Optimization using layered systems as reference materials 表面化学分析 溅射深度剖析 用层状膜系为参考物质的优化方法 |
China National Standards Sputter |
English PDF |
| GB/T 20175-2006 |
Surface chemical analysis-Sputter depth profiling-Optimization using layered systems as reference materials 表面化学分析 溅射深度剖析 用层状膜系为参考物质的优化方法 |
China National Standards Sputter |
English PDF |
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