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| Standard Code | Standard Title | Standard Class | Order |
|---|---|---|---|
| GB/T 41064-2021 |
Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films 表面化学分析 深度剖析 用单层和多层薄膜测定X射线光电子能谱、俄歇电子能谱和二次离子质谱中深度剖析溅射速率的方法 |
China National Standards analysis—Depth |
 English PDF |
| GB/T 34326-2017 |
Surface chemical analysis—Depth profiling—Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS 表面化学分析 深度剖析 AES和XPS深度剖析时离子束对准方法及其束流或束流密度测量方法 |
China National Standards analysis—Depth |
English PDF |
| GB/T 32999-2016 |
Surface chemical analysis—Depth profiling—Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer 表面化学分析 深度剖析 用机械轮廓仪栅网复型法测量溅射速率 |
China National Standards analysis—Depth |
English PDF |
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