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| Standard Code | Standard Title | Standard Class | Order |
|---|---|---|---|
| GB/T 34649-2017 |
Magnetron sputtering ruthenium target 磁控溅射用钌靶 |
China National Standards sputtering |
 English PDF |
| GB/T 32999-2016 |
Surface chemical analysis—Depth profiling—Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer 表面化学分析 深度剖析 用机械轮廓仪栅网复型法测量溅射速率 |
China National Standards sputtering |
English PDF |
| GB/T 29658-2013 |
High-Purity sputtering aluminium and aluminium alloy target used in electronic film 电子薄膜用高纯铝及铝合金溅射靶材 |
China National Standards sputtering |
English PDF |
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