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NATIONAL STANDARD OF THE PEOPLE'S REPUBLIC OF CHINA

GB/T 26070-2010

Characterization of subsurface damage in polished compound semiconductor wafers by reflectance difference spectroscopy method
化合物半导体抛光晶片亚表面损伤的反射差分谱测试方法
Issued Date:2011-01-10 　 Implemented Date:2011-10-01
Issued by: 　 The Standardization Administration of the People's Republic of China
　

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GB Standard Code GB/T 26070-2010
Standard Category China National Standards
GB Standard English Title Characterization of subsurface damage in polished compound semiconductor wafers by reflectance difference spectroscopy method
GB Standard Chinese Title 化合物半导体抛光晶片亚表面损伤的反射差分谱测试方法
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