GB/T 14847-2010
China national
standard english version:
GB
中华人民共和国国家标准
NATIONAL
STANDARD OF THE PEOPLE'S REPUBLIC OF CHINA
GB/T 14847-2010
Test mothod for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates by infrared reflectance 重掺杂衬底上轻掺杂硅外延层厚度的红外反射测量方法
Issued Date:2011-01-10
Implemented Date:2011-10-01
Issued by:
The Standardization Administration of the People's Republic of China