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NATIONAL STANDARD OF THE PEOPLE'S REPUBLIC OF CHINA

GB/T 14847-2010

Test mothod for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates by infrared reflectance
重掺杂衬底上轻掺杂硅外延层厚度的红外反射测量方法
Issued Date:2011-01-10 　 Implemented Date:2011-10-01
Issued by: 　 The Standardization Administration of the People's Republic of China
　

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GB Standard Code GB/T 14847-2010
Standard Category China National Standards
GB Standard English Title Test mothod for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates by infrared reflectance
GB Standard Chinese Title 重掺杂衬底上轻掺杂硅外延层厚度的红外反射测量方法
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English Translation Fee $15.00~$30.00   per  page
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